PHD

Short-Wavelength Light Sources for EUV Metrology

Materials department

• Contact DynamicsBart Weber
• Materials & Surface Science for EUVLRoland Bliem
• Materials Theory and ModelingEmilia Olsson

PhD: High-Harmonic Generation and spectroscopy of Liquids and Few-layer solids

Work Activities

This fully funded PhD position lies at the interface of fundamental physics and advanced spectroscopy. The research focuses on developing and applying high-harmonic generation (HHG) techniques to study ultrafast dynamics in liquids and few-layer solids. You will design and build beamlines for HHG sources, perform experiments using state-of-the-art ultrafast laser systems, develop spectroscopic and interferometric methods, and analyze large datasets to uncover the mechanisms governing light emission and structural dynamics at femtosecond to attosecond timescales.

You will join the new Short Wavelength Light Sources for EUV Metrology group in the Metrology Department at ARCNL, working in a collaborative environment alongside other PhD students and postdocs. You will contribute to publications in leading journals and present your results at international conferences.

Background:

The Short Wavelength Light Sources for EUV Metrology group explores how liquid-phase high-harmonic generation (HHG) and ultrafast spectroscopy can be harnessed to create designable coherent EUV and soft X-ray sources. Traditionally, HHG-based EUV sources are generated in gases, which can reach high photon energies (~500 eV) but suffer from low brilliance due to the dilute nature of the medium. In contrast, HHG from crystalline solids offers higher flux but is limited to lower photon energies (~10-50 eV) and has a low damage threshold, restricting operation to low intensities.

This group, led by Dr. , focuses on novel materials such as liquids and 2D solids to overcome the limitations of traditional HHG sources. Dr. Mondal's research spans liquid HHG, attosecond science, and ultrafast light-matter interactions. Her work established the fundamental principles of HHG in liquids, including scaling laws such as cutoff independence from laser wavelength and pulse duration [Mondal et al. , Nature Physics 19, 1813-1820 (2023); Optics Express 31, 34348 (2023)], and recently demonstrated multi-plateau HHG driven by off-site recombination [Mondal et al. , Nature Photonics (2025)]. By leveraging the intermediate properties of condensed, disordered systems, the group aims to design to design sources that combine the best features of both approaches.

Project Goal:

To develop designable coherent sources of extreme ultraviolet (EUV) or soft X-rays via high-harmonic generation from liquids and confined solids. The aim is to uncover the underlying ultrafast mechanisms of light-matter interaction, and to develop new control strategies-geometry, composition, field parameters, and phase-retrieval techniques-for tailored EUV/soft X-ray emission. The long-term vision is to implement these sources in imaging and metrology for semiconductor materials and interfaces, combining ultrafast temporal resolution with nanoscale spatial sensitivity.

Qualifications

Mandatory:

Applicants must hold, or be nearing completion of, a Master's degree in Physics, Physical Chemistry, Materials Science, or a closely related discipline, in accordance with Dutch university requirements for enrollment in a PhD program. Candidates should demonstrate a strong interest in nonlinear optics, materials science, and chemistry, coupled with excellent critical thinking and innovative problem-solving skills. Proficiency in both written and spoken English is required. While prior experience with femtosecond lasers is not a prerequisite, it will be considered a distinct advantage.

Preferred:

Additional skills that will be considered an asset include familiarity with programming and large data handling for data analysis (Python, MATLAB), experience with vacuum systems and EUV/X-ray instrumentation, and knowledge of high-harmonic generation or laser-matter interaction.

Work environment

ARCNL performs fundamental research, focusing on the physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. While the academic setting and research style are geared towards establishing scientific excellence, the topics in ARCNL's research program are intimately connected with the interests of the industrial partner ASML. The institute is located at Amsterdam Science Park and currently employs about 100 persons of which 65 are ambitious (young) researchers from all over the globe. www.arcnl.nl

Working conditions

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years, with a starting salary of gross € 3.115 per month and a range of employment benefits . After successful completion of the PhD research a PhD degree will be granted at a Dutch University. Several courses are offered, specially developed for Ph-studentsD. ARCNL assists any new foreign Ph-studentD with housing and visa applications and compensates their transport costs and furnishing expenses.

For further information about the position, please contact:

Tel.: